JOINING LAYER OF SEMICONDUCTOR MODULE, SEMICONDUCTOR MODULE, AND METHOD FOR MANUFACTURING SAME
Provided is a joining layer (13) of a semiconductor module (10) that is provided between an electronic component (14) and a substrate (15), and consists of a CuSn intermetallic compound. This joining layer (13) is configured such that the composition ratio of Sn increases from a central part (13a) t...
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Sprache: | eng ; fre ; ger |
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Zusammenfassung: | Provided is a joining layer (13) of a semiconductor module (10) that is provided between an electronic component (14) and a substrate (15), and consists of a CuSn intermetallic compound. This joining layer (13) is configured such that the composition ratio of Sn increases from a central part (13a) thereof to joining parts (13b and 13c) at ends (14a and 14b) of the electronic component (14). The semiconductor module (10) is produced by placing a paste containing a Cu-core/Sn-shell-powder between the electronic component (14) and the substrate (15) and heating the electronic component (14) and/or the substrate (15) at a temperature of 250°C to 350°C for 1 to 10 minutes under a pressure of 1 MPa to 30 MPa in an inert or reducing atmosphere while the paste is kept to join the electronic component (14) to the substrate (15). |
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