PHOTOSENSITIVE COMPOSITION FOR FORMING COLOR RESIST, METHOD FOR MANUFACTURING COLOR FILTER SUBSTRATE, AND COLOR FILTER SUBSTRATE

Embodiments of the present disclosure relate to a photosensitive composition for forming a color resist, a method for manufacturing a color filter substrate, and a color filter substrate. The photosensitive composition includes: at least two color resist precursors; and at least two photoinitiators,...

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Bibliographische Detailangaben
Hauptverfasser:	ZHONG, Guoqiang, TANG, Wenhao, YU, Ya, DONG, Anxin, YIN, Rui
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	Embodiments of the present disclosure relate to a photosensitive composition for forming a color resist, a method for manufacturing a color filter substrate, and a color filter substrate. The photosensitive composition includes: at least two color resist precursors; and at least two photoinitiators, each of the at least two photoinitiators being used to initiate polymerization of a corresponding one color resist precursor, of the at least two color resist precursors, to form the color resist.