PROCESS FOR THE GENERATION OF METAL-CONTAINING FILMS
The present invention is in the field of processes for preparing inorganic metal-containing films. The process comprises bringing a solid substrate in contact with a compound of general formula (I), (II), (III), or (IV) in the gaseous statewherein A is NR2 or OR with R being an alkyl group, an alken...
Gespeichert in:
| Hauptverfasser: | , , , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng ; fre ; ger |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | SCHWEINFURTH, David Dominique WINTER, Charles Hartger KARUNARATNE, Tharindu Malawara Arachchige MAYR, Lukas WEERATHUNGA SIRIKKATHUGE, Nilanka WEIGUNY, Sabine BLAKENEY, Kyle KLENK, Sinja Verena |
| description | The present invention is in the field of processes for preparing inorganic metal-containing films. The process comprises bringing a solid substrate in contact with a compound of general formula (I), (II), (III), or (IV) in the gaseous statewherein A is NR2 or OR with R being an alkyl group, an alkenyl group, an aryl group, or a silyl group,E is NR or O,n is 0, 1 or 2, m is 0, 1 or 2, andR' is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP3728688B1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP3728688B1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP3728688B13</originalsourceid><addsrcrecordid>eNrjZDAJCPJ3dg0OVnDzD1II8XBVcHf1cw1yDPH091Pwd1PwdQ1x9NF19vcLcfT08_RzV3Dz9PEN5mFgTUvMKU7lhdLcDApuriHOHrqpBfnxqcUFicmpeakl8a4BxuZGFmYWFk6GxkQoAQB0tycG</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PROCESS FOR THE GENERATION OF METAL-CONTAINING FILMS</title><source>esp@cenet</source><creator>SCHWEINFURTH, David Dominique ; WINTER, Charles Hartger ; KARUNARATNE, Tharindu Malawara Arachchige ; MAYR, Lukas ; WEERATHUNGA SIRIKKATHUGE, Nilanka ; WEIGUNY, Sabine ; BLAKENEY, Kyle ; KLENK, Sinja Verena</creator><creatorcontrib>SCHWEINFURTH, David Dominique ; WINTER, Charles Hartger ; KARUNARATNE, Tharindu Malawara Arachchige ; MAYR, Lukas ; WEERATHUNGA SIRIKKATHUGE, Nilanka ; WEIGUNY, Sabine ; BLAKENEY, Kyle ; KLENK, Sinja Verena</creatorcontrib><description>The present invention is in the field of processes for preparing inorganic metal-containing films. The process comprises bringing a solid substrate in contact with a compound of general formula (I), (II), (III), or (IV) in the gaseous statewherein A is NR2 or OR with R being an alkyl group, an alkenyl group, an aryl group, or a silyl group,E is NR or O,n is 0, 1 or 2, m is 0, 1 or 2, andR' is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group.</description><language>eng ; fre ; ger</language><subject>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; ORGANIC CHEMISTRY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20211110&DB=EPODOC&CC=EP&NR=3728688B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20211110&DB=EPODOC&CC=EP&NR=3728688B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SCHWEINFURTH, David Dominique</creatorcontrib><creatorcontrib>WINTER, Charles Hartger</creatorcontrib><creatorcontrib>KARUNARATNE, Tharindu Malawara Arachchige</creatorcontrib><creatorcontrib>MAYR, Lukas</creatorcontrib><creatorcontrib>WEERATHUNGA SIRIKKATHUGE, Nilanka</creatorcontrib><creatorcontrib>WEIGUNY, Sabine</creatorcontrib><creatorcontrib>BLAKENEY, Kyle</creatorcontrib><creatorcontrib>KLENK, Sinja Verena</creatorcontrib><title>PROCESS FOR THE GENERATION OF METAL-CONTAINING FILMS</title><description>The present invention is in the field of processes for preparing inorganic metal-containing films. The process comprises bringing a solid substrate in contact with a compound of general formula (I), (II), (III), or (IV) in the gaseous statewherein A is NR2 or OR with R being an alkyl group, an alkenyl group, an aryl group, or a silyl group,E is NR or O,n is 0, 1 or 2, m is 0, 1 or 2, andR' is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group.</description><subject>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>ORGANIC CHEMISTRY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDAJCPJ3dg0OVnDzD1II8XBVcHf1cw1yDPH091Pwd1PwdQ1x9NF19vcLcfT08_RzV3Dz9PEN5mFgTUvMKU7lhdLcDApuriHOHrqpBfnxqcUFicmpeakl8a4BxuZGFmYWFk6GxkQoAQB0tycG</recordid><startdate>20211110</startdate><enddate>20211110</enddate><creator>SCHWEINFURTH, David Dominique</creator><creator>WINTER, Charles Hartger</creator><creator>KARUNARATNE, Tharindu Malawara Arachchige</creator><creator>MAYR, Lukas</creator><creator>WEERATHUNGA SIRIKKATHUGE, Nilanka</creator><creator>WEIGUNY, Sabine</creator><creator>BLAKENEY, Kyle</creator><creator>KLENK, Sinja Verena</creator><scope>EVB</scope></search><sort><creationdate>20211110</creationdate><title>PROCESS FOR THE GENERATION OF METAL-CONTAINING FILMS</title><author>SCHWEINFURTH, David Dominique ; WINTER, Charles Hartger ; KARUNARATNE, Tharindu Malawara Arachchige ; MAYR, Lukas ; WEERATHUNGA SIRIKKATHUGE, Nilanka ; WEIGUNY, Sabine ; BLAKENEY, Kyle ; KLENK, Sinja Verena</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP3728688B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2021</creationdate><topic>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>ORGANIC CHEMISTRY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>SCHWEINFURTH, David Dominique</creatorcontrib><creatorcontrib>WINTER, Charles Hartger</creatorcontrib><creatorcontrib>KARUNARATNE, Tharindu Malawara Arachchige</creatorcontrib><creatorcontrib>MAYR, Lukas</creatorcontrib><creatorcontrib>WEERATHUNGA SIRIKKATHUGE, Nilanka</creatorcontrib><creatorcontrib>WEIGUNY, Sabine</creatorcontrib><creatorcontrib>BLAKENEY, Kyle</creatorcontrib><creatorcontrib>KLENK, Sinja Verena</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SCHWEINFURTH, David Dominique</au><au>WINTER, Charles Hartger</au><au>KARUNARATNE, Tharindu Malawara Arachchige</au><au>MAYR, Lukas</au><au>WEERATHUNGA SIRIKKATHUGE, Nilanka</au><au>WEIGUNY, Sabine</au><au>BLAKENEY, Kyle</au><au>KLENK, Sinja Verena</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PROCESS FOR THE GENERATION OF METAL-CONTAINING FILMS</title><date>2021-11-10</date><risdate>2021</risdate><abstract>The present invention is in the field of processes for preparing inorganic metal-containing films. The process comprises bringing a solid substrate in contact with a compound of general formula (I), (II), (III), or (IV) in the gaseous statewherein A is NR2 or OR with R being an alkyl group, an alkenyl group, an aryl group, or a silyl group,E is NR or O,n is 0, 1 or 2, m is 0, 1 or 2, andR' is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng ; fre ; ger |
| recordid | cdi_epo_espacenet_EP3728688B1 |
| source | esp@cenet |
| subjects | ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY ORGANIC CHEMISTRY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | PROCESS FOR THE GENERATION OF METAL-CONTAINING FILMS |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-01T05%3A52%3A12IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=SCHWEINFURTH,%20David%20Dominique&rft.date=2021-11-10&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP3728688B1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |