PROCESS FOR THE GENERATION OF METAL-CONTAINING FILMS

The present invention is in the field of processes for preparing inorganic metal-containing films. The process comprises bringing a solid substrate in contact with a compound of general formula (I), (II), (III), or (IV) in the gaseous statewherein A is NR2 or OR with R being an alkyl group, an alken...

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Bibliographische Detailangaben
Hauptverfasser:	SCHWEINFURTH, David Dominique, WINTER, Charles Hartger, KARUNARATNE, Tharindu Malawara Arachchige, MAYR, Lukas, WEERATHUNGA SIRIKKATHUGE, Nilanka, WEIGUNY, Sabine, BLAKENEY, Kyle, KLENK, Sinja Verena
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY ORGANIC CHEMISTRY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The present invention is in the field of processes for preparing inorganic metal-containing films. The process comprises bringing a solid substrate in contact with a compound of general formula (I), (II), (III), or (IV) in the gaseous statewherein A is NR2 or OR with R being an alkyl group, an alkenyl group, an aryl group, or a silyl group,E is NR or O,n is 0, 1 or 2, m is 0, 1 or 2, andR' is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group.