EMC CONTROL FOR PULSED HIGH VOLTAGE SOURCE OF A PLASMA DEVICE FOR MEDICAL TREATMENT

The invention relates to a high voltage source to be coupled to an electrode arrangement for a dielectric barrier discharge plasma treatment. It has a high voltage transformer device including a primary and secondary inductor coupled via a magnetic circuit. A feed circuit including a power capacitor...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: ZEPER, Wouter Bastiaan, SMITS, Paulien, DE VRIES, Douwe Henrik
Format: Patent
Sprache:eng ; fre ; ger
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Beschreibung
Zusammenfassung:The invention relates to a high voltage source to be coupled to an electrode arrangement for a dielectric barrier discharge plasma treatment. It has a high voltage transformer device including a primary and secondary inductor coupled via a magnetic circuit. A feed circuit including a power capacitor, the power capacitor coupled with the primary inductor and a first controllable conductor in series. A controller is arranged to intermittent switching of the first controllable conductor in on- and off-states; and a second controllable conductor is coupled in parallel to the primary windings; the controller arranged to switch the second controllable conductor to a conducting on-state when the first controllable conductor is in an on-state to short the resonating current in the primary inductor.