METHOD AND APPARATUS FOR CLEANING A PLASMA PROCESSING APPARATUS

Method of cleaning a first material from a plasma processing apparatus, comprising: subjecting the plasma processing apparatus to a jet of a second material so as to remove the first material from the plasma processing apparatus; mixing the removed first material with a third material configured to...

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Bibliographische Detailangaben
1. Verfasser: SINGH, Shailendra Vikram
Format: Patent
Sprache:eng ; fre ; ger
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