METHOD AND APPARATUS FOR CLEANING A PLASMA PROCESSING APPARATUS

METHOD AND APPARATUS FOR CLEANING A PLASMA PROCESSING APPARATUS

Method of cleaning a first material from a plasma processing apparatus, comprising: subjecting the plasma processing apparatus to a jet of a second material so as to remove the first material from the plasma processing apparatus; mixing the removed first material with a third material configured to...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: SINGH, Shailendra Vikram
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
GRINDING
PERFORMING OPERATIONS
POLISHING
TRANSPORTING
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Method of cleaning a first material from a plasma processing apparatus, comprising: subjecting the plasma processing apparatus to a jet of a second material so as to remove the first material from the plasma processing apparatus; mixing the removed first material with a third material configured to dissipate the first material therein.