METHOD FOR PRODUCING OSCILLATOR SUBSTRATE AND OSCILLATOR SUBSTRATE
Provided is method for producing an oscillator substrate in which an oscillating section (17a) of an oscillating membrane (17) facing an oscillation space (15) is configured to oscillate in a direction normal to the membrane surface of the oscillating membrane (17), including: forming a sacrifice la...
Gespeichert in:
1. Verfasser: | |
---|---|
Format: | Patent |
Sprache: | eng ; fre ; ger |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | Provided is method for producing an oscillator substrate in which an oscillating section (17a) of an oscillating membrane (17) facing an oscillation space (15) is configured to oscillate in a direction normal to the membrane surface of the oscillating membrane (17), including: forming a sacrifice layer within a region over a substrate (10) intended to become the oscillation space (15), sacrifice layer being formed of same material as the substrate (10); forming the oscillating membrane (17) over the sacrifice layer; forming a sacrifice layer removing hole (12) in the substrate (10) in a manner to lead to the sacrifice layer from a surface of the substrate (10) opposite to the sacrifice layer; forming an etching protective film (13) over an internal wall surface of the sacrifice layer removing hole (12); and removing the sacrifice layer by etching through the sacrifice layer removing hole (12) to form the oscillation space (15). |
---|