DISPLAY SUBSTRATE POLYIMIDE FILM
The present invention provides a display substrate polyimide film having: remarkably improved insulation characteristics; inner pores, included in the polyimide film, of which the maximum size is 10 nm or less; and a high maximum dielectric breakdown voltage of 350 V/µm or more. The polyimide film a...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | The present invention provides a display substrate polyimide film having: remarkably improved insulation characteristics; inner pores, included in the polyimide film, of which the maximum size is 10 nm or less; and a high maximum dielectric breakdown voltage of 350 V/µm or more. The polyimide film according to the present invention has improved insulation characteristics so as to be capable of suppressing the generation of a current fluctuation of TFTs according to the long-term driving of a TFT device in a display such as an OLED, thereby enabling the deterioration of the contrast of a display to be reduced. |
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