DISPLAY SUBSTRATE POLYIMIDE FILM

The present invention provides a display substrate polyimide film having: remarkably improved insulation characteristics; inner pores, included in the polyimide film, of which the maximum size is 10 nm or less; and a high maximum dielectric breakdown voltage of 350 V/µm or more. The polyimide film a...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: CHOI, Danbi, HONG, Ye Ji, PARK, Jinyoung
Format: Patent
Sprache:eng ; fre ; ger
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Beschreibung
Zusammenfassung:The present invention provides a display substrate polyimide film having: remarkably improved insulation characteristics; inner pores, included in the polyimide film, of which the maximum size is 10 nm or less; and a high maximum dielectric breakdown voltage of 350 V/µm or more. The polyimide film according to the present invention has improved insulation characteristics so as to be capable of suppressing the generation of a current fluctuation of TFTs according to the long-term driving of a TFT device in a display such as an OLED, thereby enabling the deterioration of the contrast of a display to be reduced.