DEVICES AND METHODS FOR THIN FILM CHEMICAL PROCESSING

Producing nanostructure materials in a thin film reactor (TFR) from starting material of inorganic or organic material of layered or two dimensional (2D) structure or inorganic material transformed in situ into 2D inorganic material, or single walled carbon nanotubes (SWCNTs), and a solvent or liqui...

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Bibliographische Detailangaben
Hauptverfasser:	VIMALANATHAN, Kasturi, JONES, Darryl Bruce, ALSULAMI, Ibrahim Khalaf M, RASTON, Colin, ALHARBI, Thaar Muqhim D
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMISTRY COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F COMPOUNDS THEREOF INORGANIC CHEMISTRY METALLURGY NON-METALLIC ELEMENTS PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	Producing nanostructure materials in a thin film reactor (TFR) from starting material of inorganic or organic material of layered or two dimensional (2D) structure or inorganic material transformed in situ into 2D inorganic material, or single walled carbon nanotubes (SWCNTs), and a solvent or liquid phase. The TFR can be a vortex fluidic device (VFD) or a device with spaced first and second fluid contact surfaces, which can be conical, for relative rotation to generate shear stress in the thin film therebetween. A liquid supply means delivers a liquid between the first and second fluid contact surfaces. The composition can be exposed to laser energy. The thin film reactor can form graphene, graphene oxide, scrolls, tubes, spheres or rings of the layered or 2D material.