ALIGNMENT METHOD AND ASSOCIATED METROLOGY DEVICE

Disclosed is method of aligning a substrate within an apparatus. The method comprises determining a substrate grid based on measurements of a plurality of targets, each at different locations on a substrate. The determining step comprises repetitions of: updating said substrate grid after each measu...

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Bibliographische Detailangaben
Hauptverfasser:	TSENG, Chien-Hung, PEETERS, Marcel Pieter Jacobus, VAN DE RIJDT, Johannes Hubertus Antonius, VAN DE GROES, Henricus Martinus Johannes, PELLEMANS, Henricus Petrus Maria
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Disclosed is method of aligning a substrate within an apparatus. The method comprises determining a substrate grid based on measurements of a plurality of targets, each at different locations on a substrate. The determining step comprises repetitions of: updating said substrate grid after each measurement of a target, and using the updated grid to align a measurement of a subsequent target.