METHOD FOR CONTROLING A MANUFACTURING PROCESS AND ASSOCIATED APPARATUSES

Disclosed is a method and associated apparatus for determining performance metric corrections relating to a performance metric of a lithographic process. The method comprises obtaining a first set of pre-exposure metrology data, (for example having been measured on a substrate in a process external to an exposure process to expose a structure on the substrate). The first set of pre-exposure metrology data is processed to remove control components which are at least partially correctable by a control process which is part of the lithographic process. A trained model is applied to the processed pre-exposure metrology data to determine said performance metric corrections for said substrate.