MICROWAVE REACTOR FOR DEPOSITION OR TREATMENT OF CARBON COMPOUNDS

A plasma reactor for processing a workpiece includes a chamber having a dielectric window, a workpiece support to hold a workpiece in the chamber, a rotary coupling comprising a stationary stage configured to be coupled to a microwave source and a rotatable stage having an axis of rotation, a microw...

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Bibliographische Detailangaben
Hauptverfasser: ZHOU, Jie, LIANG, Qiwei, PISHARODY, Gautam, KHAN, Adib M, YING, Chentsau, NEMANI, Srinivas D, CHEN, Guannan
Format: Patent
Sprache:eng ; fre ; ger
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Beschreibung
Zusammenfassung:A plasma reactor for processing a workpiece includes a chamber having a dielectric window, a workpiece support to hold a workpiece in the chamber, a rotary coupling comprising a stationary stage configured to be coupled to a microwave source and a rotatable stage having an axis of rotation, a microwave antenna and overlying the dielectric window of the chamber, a rotary actuator to rotate the microwave antenna, and a process gas distributor including a gas distribution ring surrounding the workpiece support. The microwave antenna includes at least one conduit coupled to the rotary stage. The gas distribution ring including a cylindrical chamber liner separating a circular conduit from the chamber and a plurality of apertures extending radially through the liner to connect the conduit to the chamber.