GAS DELIVERY SYSTEM FOR HIGH PRESSURE PROCESSING CHAMBER

A high-pressure processing system comprising a first chamber having inner walls; a support to hold a substrate in the first chamber; a second chamber surrounding the first chamber, the second chamber being defined by a volume between the inner walls of the first chamber and outer walls; a valve asse...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	MALIK, Sultan, LIANG, Qiwei, WONG, Keith Tatseun, NEMANI, Srinivas D, KHAN, Adib
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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Beschreibung
Zusammenfassung:	A high-pressure processing system comprising a first chamber having inner walls; a support to hold a substrate in the first chamber; a second chamber surrounding the first chamber, the second chamber being defined by a volume between the inner walls of the first chamber and outer walls; a valve assembly for isolating the first chamber from the second chamber, the valve assembly comprising a slit extending through a first wall of the inner walls and configured to allow the substrate to be moved in and out of the first chamber, and an arm extending through the slit, the arm comprising an internal gas channel configured for a cooling gas flow through the arm, wherein the arm of the valve assembly further extends through an aperture in the outer walls, and is configured to be moved relative to the inner walls of the first chamber to a position in which the arm forms a seal to isolate the first chamber from the second chamber.