FILM-FORMING MATERIAL, LITHOGRAPHIC FILM-FORMING COMPOSITION, OPTICAL COMPONENT-FORMING MATERIAL, RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, RESIST PERMANENT FILM, RADIATION-SENSITIVE COMPOSITION, AMORPHOUS FILM PRODUCTION METHOD, LITHOGRAPHIC UNDERLAYER FILM-FORMING MATERIAL, LITHOGRAPHIC UNDERLAYER FILM-FORMING COMPOSITION, LITHOGRAPHIC UNDERLAYER FILM PRODUCTION METHOD, AND CIRCUIT PATTERN FORMATION METHOD
Provided is a film-forming material;to which a wet process can be applied,which is useful for forming such as;a lithographic film having excellent heat resistance, resist pattern shape, etching resistance, embedding characteristics on a stepped substrate, and film flatness, andan optical component h...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | Provided is a film-forming material;to which a wet process can be applied,which is useful for forming such as;a lithographic film having excellent heat resistance, resist pattern shape, etching resistance, embedding characteristics on a stepped substrate, and film flatness, andan optical component having excellent heat resistance, transparency, and refractive index, andwhich comprises a triazine-based compound represented by formula (1). |
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