FILM-FORMING MATERIAL, LITHOGRAPHIC FILM-FORMING COMPOSITION, OPTICAL COMPONENT-FORMING MATERIAL, RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, RESIST PERMANENT FILM, RADIATION-SENSITIVE COMPOSITION, AMORPHOUS FILM PRODUCTION METHOD, LITHOGRAPHIC UNDERLAYER FILM-FORMING MATERIAL, LITHOGRAPHIC UNDERLAYER FILM-FORMING COMPOSITION, LITHOGRAPHIC UNDERLAYER FILM PRODUCTION METHOD, AND CIRCUIT PATTERN FORMATION METHOD

Provided is a film-forming material;to which a wet process can be applied,which is useful for forming such as;a lithographic film having excellent heat resistance, resist pattern shape, etching resistance, embedding characteristics on a stepped substrate, and film flatness, andan optical component h...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: ECHIGO, Masatoshi, MIKI, Yasushi
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Provided is a film-forming material;to which a wet process can be applied,which is useful for forming such as;a lithographic film having excellent heat resistance, resist pattern shape, etching resistance, embedding characteristics on a stepped substrate, and film flatness, andan optical component having excellent heat resistance, transparency, and refractive index, andwhich comprises a triazine-based compound represented by formula (1).