PROCESSING APPARATUS AND PROCESSING METHOD

A processing apparatus is equipped with: a first stage system that has a table (12) on which a workpiece (W) is placed and moves the workpiece held by the table; a beam irradiation system (500) that includes a condensing optical system (530) to emit beams (LB); and a controller to control the first...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: SHIBAZAKI, Yuichi
Format: Patent
Sprache:eng ; fre ; ger
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Beschreibung
Zusammenfassung:A processing apparatus is equipped with: a first stage system that has a table (12) on which a workpiece (W) is placed and moves the workpiece held by the table; a beam irradiation system (500) that includes a condensing optical system (530) to emit beams (LB); and a controller to control the first stage system and the beam irradiation system, and processing is performed to a target portion of the workpiece while the table and the beams from the condensing optical system are relatively moved, and at least one of an intensity distribution of the beams at a first plane (MP) on an exit surface side of the condensing optical system and an intensity distribution of the beams at a second plane whose position in a direction of an optical axis (AX) of the condensing optical system is different from the first plane can be changed.