SUPPORT AND METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT MOUNTING SUBSTRATE IN WHICH SAID SUPPORT IS USED
A support including a heat resistant film layer and a resin layer, wherein the heat resistant film layer is laminated on at least one side (a first side) of the resin layer, and the resin layer is in a semi-cured state (B stage).
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | A support including a heat resistant film layer and a resin layer, wherein the heat resistant film layer is laminated on at least one side (a first side) of the resin layer, and the resin layer is in a semi-cured state (B stage). |
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