METHOD OF MANUFACTURING SEMICONDUCTOR LASER ELEMENT, AND SEMICONDUCTOR LASER DEVICE THEREOF AND GAS ANALYZER
In order to form a reflection film on a rear end facet of a waveguide more easily than conventional, by etching a laminated structure formed on a substrate 2, a plurality of waveguides 3L segmented in a lattice shape are formed, and a reflection film 4 is formed on a surface of each of the waveguide...
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| Format: | Patent |
| Sprache: | eng ; fre ; ger |
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| Zusammenfassung: | In order to form a reflection film on a rear end facet of a waveguide more easily than conventional, by etching a laminated structure formed on a substrate 2, a plurality of waveguides 3L segmented in a lattice shape are formed, and a reflection film 4 is formed on a surface of each of the waveguides 3L for reflecting light in each of the waveguides 3L. |
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