SUPERVISORY UNIT WASHING FACILITY

A facility used for sanitation, cosmetics, and private or industrial cleaning includes a water supply, an outlet unit, a consumable unit and a control unit. The facility is a low through-flow rate facility. The control unit includes a sensor adapted to measure at least one value, a user interface un...

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1. Verfasser: MOCK, Elmar
Format: Patent
Sprache:eng ; fre ; ger
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Beschreibung
Zusammenfassung:A facility used for sanitation, cosmetics, and private or industrial cleaning includes a water supply, an outlet unit, a consumable unit and a control unit. The facility is a low through-flow rate facility. The control unit includes a sensor adapted to measure at least one value, a user interface unit adapted to enter a set-point and a closed loop control unit configured to adapt an operation parameter of the facility in consideration of the set-point.