SUPERVISORY UNIT WASHING FACILITY
A facility used for sanitation, cosmetics, and private or industrial cleaning includes a water supply, an outlet unit, a consumable unit and a control unit. The facility is a low through-flow rate facility. The control unit includes a sensor adapted to measure at least one value, a user interface un...
Gespeichert in:
1. Verfasser: | |
---|---|
Format: | Patent |
Sprache: | eng ; fre ; ger |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | A facility used for sanitation, cosmetics, and private or industrial cleaning includes a water supply, an outlet unit, a consumable unit and a control unit. The facility is a low through-flow rate facility. The control unit includes a sensor adapted to measure at least one value, a user interface unit adapted to enter a set-point and a closed loop control unit configured to adapt an operation parameter of the facility in consideration of the set-point. |
---|