OPTOMECHANICAL SYSTEM AND METHOD FOR CONTROLLING THE PHOTOMETRIC DISTRIBUTION OF LUMINAIRES AND CORRESPONDING LUMINAIRES

The present invention relates to an optomechanical system (1), for dynamically controlling the photometric distribution of a luminaire, comprising a static frame (10), a light emitting substrate (50) with one or more light emitting elements (51) capable of emitting incident light (80), an optical layer (40) comprising one or more optical elements (41) capable of capturing incident light (80) and transmitting transmitted light (90), and a shifting mechanism (60) for translationally moving along at least one direction a movable element, which is chosen from either the optical layer (40) or the light emitting substrate (50). The shifting mechanism (60) comprises further one or more guiding elements (61), capable of maintaining the inclination angle between the light emitting substrate (50) and the optical layer (40) while moving the movable element (40,50). The optomechanical system is configured in such a way that the photometric distribution of the luminaire is dynamically controllable by adjusting the relative positon of the light emitting elements (51) with respect to the optical elements (41). The present invention relates also to luminaires comprising such an optomechanical system (1) and to a related method for adjusting the photometric distribution of luminaires.