THIN FILM FORMATION METHOD, THIN FILM FORMATION DEVICE, AND LITHIUM BATTERY

A thin film formation method according to an embodiment of the present invention includes depositing a lithium metal film on a base material in a vacuum chamber. A surface of the lithium metal film is oxidized in the vacuum chamber. The oxidized surface of the lithium metal film is carbonized in the...

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Hauptverfasser: SASAKI, Shunsuke, GIBO, Manabu, KIMOTO, Takahito
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Sprache:eng ; fre ; ger
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creator SASAKI, Shunsuke
GIBO, Manabu
KIMOTO, Takahito
description A thin film formation method according to an embodiment of the present invention includes depositing a lithium metal film on a base material in a vacuum chamber. A surface of the lithium metal film is oxidized in the vacuum chamber. The oxidized surface of the lithium metal film is carbonized in the vacuum chamber.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP3553203A4</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP3553203A4</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP3553203A43</originalsourceid><addsrcrecordid>eNrjZPAO8fD0U3Dz9PFVcPMP8nUM8fT3U_B1DfHwd9FRwCbn4hrm6eyqo-Do56Lg4wlUEeqr4OQYEuIaFMnDwJqWmFOcyguluRkU3FxDnD10Uwvy41OLCxKTU_NSS-JdA4xNTY2NDIwdTYyJUAIADC4s8Q</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>THIN FILM FORMATION METHOD, THIN FILM FORMATION DEVICE, AND LITHIUM BATTERY</title><source>esp@cenet</source><creator>SASAKI, Shunsuke ; GIBO, Manabu ; KIMOTO, Takahito</creator><creatorcontrib>SASAKI, Shunsuke ; GIBO, Manabu ; KIMOTO, Takahito</creatorcontrib><description>A thin film formation method according to an embodiment of the present invention includes depositing a lithium metal film on a base material in a vacuum chamber. A surface of the lithium metal film is oxidized in the vacuum chamber. The oxidized surface of the lithium metal film is carbonized in the vacuum chamber.</description><language>eng ; fre ; ger</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSIONOF CHEMICAL INTO ELECTRICAL ENERGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20201209&amp;DB=EPODOC&amp;CC=EP&amp;NR=3553203A4$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20201209&amp;DB=EPODOC&amp;CC=EP&amp;NR=3553203A4$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SASAKI, Shunsuke</creatorcontrib><creatorcontrib>GIBO, Manabu</creatorcontrib><creatorcontrib>KIMOTO, Takahito</creatorcontrib><title>THIN FILM FORMATION METHOD, THIN FILM FORMATION DEVICE, AND LITHIUM BATTERY</title><description>A thin film formation method according to an embodiment of the present invention includes depositing a lithium metal film on a base material in a vacuum chamber. A surface of the lithium metal film is oxidized in the vacuum chamber. The oxidized surface of the lithium metal film is carbonized in the vacuum chamber.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSIONOF CHEMICAL INTO ELECTRICAL ENERGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPAO8fD0U3Dz9PFVcPMP8nUM8fT3U_B1DfHwd9FRwCbn4hrm6eyqo-Do56Lg4wlUEeqr4OQYEuIaFMnDwJqWmFOcyguluRkU3FxDnD10Uwvy41OLCxKTU_NSS-JdA4xNTY2NDIwdTYyJUAIADC4s8Q</recordid><startdate>20201209</startdate><enddate>20201209</enddate><creator>SASAKI, Shunsuke</creator><creator>GIBO, Manabu</creator><creator>KIMOTO, Takahito</creator><scope>EVB</scope></search><sort><creationdate>20201209</creationdate><title>THIN FILM FORMATION METHOD, THIN FILM FORMATION DEVICE, AND LITHIUM BATTERY</title><author>SASAKI, Shunsuke ; GIBO, Manabu ; KIMOTO, Takahito</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP3553203A43</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2020</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSIONOF CHEMICAL INTO ELECTRICAL ENERGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>SASAKI, Shunsuke</creatorcontrib><creatorcontrib>GIBO, Manabu</creatorcontrib><creatorcontrib>KIMOTO, Takahito</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SASAKI, Shunsuke</au><au>GIBO, Manabu</au><au>KIMOTO, Takahito</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>THIN FILM FORMATION METHOD, THIN FILM FORMATION DEVICE, AND LITHIUM BATTERY</title><date>2020-12-09</date><risdate>2020</risdate><abstract>A thin film formation method according to an embodiment of the present invention includes depositing a lithium metal film on a base material in a vacuum chamber. A surface of the lithium metal film is oxidized in the vacuum chamber. The oxidized surface of the lithium metal film is carbonized in the vacuum chamber.</abstract><oa>free_for_read</oa></addata></record>
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language eng ; fre ; ger
recordid cdi_epo_espacenet_EP3553203A4
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRICITY
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSIONOF CHEMICAL INTO ELECTRICAL ENERGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
title THIN FILM FORMATION METHOD, THIN FILM FORMATION DEVICE, AND LITHIUM BATTERY
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-06T12%3A43%3A36IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=SASAKI,%20Shunsuke&rft.date=2020-12-09&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP3553203A4%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true