THIN FILM FORMATION METHOD, THIN FILM FORMATION DEVICE, AND LITHIUM BATTERY

A thin film formation method according to an embodiment of the present invention includes depositing a lithium metal film on a base material in a vacuum chamber. A surface of the lithium metal film is oxidized in the vacuum chamber. The oxidized surface of the lithium metal film is carbonized in the...

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Bibliographische Detailangaben
Hauptverfasser:	SASAKI, Shunsuke, GIBO, Manabu, KIMOTO, Takahito
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSIONOF CHEMICAL INTO ELECTRICAL ENERGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A thin film formation method according to an embodiment of the present invention includes depositing a lithium metal film on a base material in a vacuum chamber. A surface of the lithium metal film is oxidized in the vacuum chamber. The oxidized surface of the lithium metal film is carbonized in the vacuum chamber.