REACTION TREATMENT CONTAINER AND REACTION TREATMENT DEVICE

A reaction processing vessel 10 includes: a substrate 14; a channel 12 for a sample 50 to move that is formed on the substrate 14; a first air communication port 24 and a second air communication port 26 provided at respective ends of the channel 12; and a thermal cycle region 32 for applying a ther...

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1. Verfasser: FUKUZAWA Takashi
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:A reaction processing vessel 10 includes: a substrate 14; a channel 12 for a sample 50 to move that is formed on the substrate 14; a first air communication port 24 and a second air communication port 26 provided at respective ends of the channel 12; and a thermal cycle region 32 for applying a thermal cycle to the sample 50 that is formed between the first air communication port 24 and the second air communication port 26 in the channel 12. The channel 12 includes a first branch channel 61 and a second branch channel 62 between the thermal cycle region 32 and the first air communication port 24.