POSITIVE PHOTOSENSITIVE COMPOSITION AND THIN FILM TRANSISTOR

The present invention aims to provide positive photosensitive compositions that have excellent patterning properties and can exhibit excellent electrical insulation reliability when cured (as thin films). The positive photosensitive composition according to the present invention is characterized by...

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Bibliographische Detailangaben
Hauptverfasser:	MANABE, Takao, KITAJIMA, Aki, IDE, Masahito, INARI, Hirofumi, TAHARA, Komei
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The present invention aims to provide positive photosensitive compositions that have excellent patterning properties and can exhibit excellent electrical insulation reliability when cured (as thin films). The positive photosensitive composition according to the present invention is characterized by including (G) a compound having a structure represented by formula (X1) or (X2);(H) a compound having a structure that decomposes in the presence of acid to generate an acidic group or a hydroxyl group; and(D) a photoacid generator,the formulas (X1) and (X2) respectively being: