METAL MASK MATERIAL AND METHOD FOR MANUFACTURING SAME

The purpose of the present invention is to provide a metal mask material which has a very small number of fine oxide-based nonmetallic inclusions and is capable of exhibiting excellent etching processability. Provided are: a metal mask material which has composition containing, in mass%, 0.01% or le...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: OMORI, Akihiro, HADANO, Yuuichi
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
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