METAL MASK MATERIAL AND METHOD FOR MANUFACTURING SAME

The purpose of the present invention is to provide a metal mask material which has a very small number of fine oxide-based nonmetallic inclusions and is capable of exhibiting excellent etching processability. Provided are: a metal mask material which has composition containing, in mass%, 0.01% or le...

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Bibliographische Detailangaben
Hauptverfasser:	OMORI, Akihiro, HADANO, Yuuichi
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	ALLOYS BASIC ELECTRIC ELEMENTS CHEMISTRY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FERROUS OR NON-FERROUS ALLOYS GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUSMETALS OR ALLOYS MAKING METAL MALLEABLE BY DECARBURISATION, TEMPERING OR OTHERTREATMENTS METALLURGY METALLURGY OF IRON MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS PRETREATMENT OF RAW MATERIALS PROCESSING OF PIG-IRON, e.g. REFINING, MANUFACTURE OFWROUGHT-IRON OR STEEL PRODUCTION AND REFINING OF METALS SEMICONDUCTOR DEVICES TREATMENT IN MOLTEN STATE OF FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FERROUS METALS
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Beschreibung
Zusammenfassung:	The purpose of the present invention is to provide a metal mask material which has a very small number of fine oxide-based nonmetallic inclusions and is capable of exhibiting excellent etching processability. Provided are: a metal mask material which has composition containing, in mass%, 0.01% or less of C, 0.5% or less of Si, 1.0% or less of Mn, and 30-50% of Ni, with the balance comprising Fe and inevitable impurities, wherein, per 1 g of the metal mask material, the number of oxide-based nonmetallic inclusions having a diameter greater than 10.0 µm is 2.0 or less and the number of oxide-based nonmetallic inclusions having a diameter of 6.0-10.0 µm is 20.0 or less, and the metal mask material is in the shape of a thin plate having a plate thickness of 0.25 mm or less; and a method for manufacturing the metal mask material.