PREPARATION DEVICE FOR MULTI-ELEMENT ALLOY THIN FILM, AND PREPARATION METHOD THEREFOR

An apparatus and a method for preparing a multi-component alloy film are provided. The apparatus includes a chamber to which a vacuum pump group is connected, a plurality of metal liquid containers for containing high-purity metal liquids, a rotatable base for placing a deposition substrate, a plurality of laser groups for generating double-pulse lasers, a base controller, and a data collection control unit. The data collection control unit is used for collecting temperature and displacement information of the rotatable base, and controlling a pressuring frequency of the pulse pressuring device and the emitting frequency and energy of the double-pulse lasers of the plurality of laser groups, thereby realizing the automatic control of plasma film deposition. The base controller is used for controlling the temperature, rotation and movement of the base based on the temperature and displacement information of the base collected by the data collection control unit. With the preparation method and apparatus of the invention, multi-component alloy films with a large difference between high and low melting points, a film of a gas compound of a multi-component alloy, a film with chemical compositions changing in gradient and a multi-component alloy film with any vary ratio of alloy compositions in the thickness direction can be rapidly prepared.