LITHOGRAPHIC METHOD

A method for determining one or more optimized values of an operational parameter of a sensor system configured for measuring a property of a substrate is disclosed the method comprising: determining a quality parameter for a plurality of substrates; determining measurement parameters for the plural...

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Bibliographische Detailangaben
Hauptverfasser:	HULSEBOS, Edo, Maria, BRINKHOF, Ralph, VU, Tran, Thanh, Thuy, CEKLI, Hakki, Ergun, VAN T WESTEINDE, Maaike, YAGUBIZADE, Hadi, MEGENS, Henricus, Johannes, Lambertus, GOOSEN, Maikel, Robert, BIJNEN, Franciscus, Godefridus, Casper, ROELOFS, Willem, Seine, Christian, ERDAMAR, Ahmet Koray, RIJPSTRA, Manouk, KOU, Weitian, TINNEMANS, Patricius, Aloysius Jacobus, COX, Matthijs, VERHEES, Loek, Johannes, Petrus, VAN DE VEN, Wendy, Johanna, Martina
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A method for determining one or more optimized values of an operational parameter of a sensor system configured for measuring a property of a substrate is disclosed the method comprising: determining a quality parameter for a plurality of substrates; determining measurement parameters for the plurality of substrates obtained using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameters; and determining the one or more optimized values of the operational parameter based on the comparing.