ION IMPLANTATION AMOUNT ADJUSTMENT APPARATUS AND METHOD, ION IMPLANTATION DEVICE, AND DETERMINATION METHOD

The present disclosure relates to an ion implantation amount adjustment device that includes: an adjuster configured to turn on or off an ion outlet of the ion implantation apparatus; and an actuator configured to control movement of the adjuster to adjust an opening degree of the ion outlet.

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Hauptverfasser: LI, Rujian, KANG, Dongwoo, FU, Yongyi, JING, Hao, LIU, Chenliang, LUO, Kang
Format: Patent
Sprache:eng ; fre ; ger
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creator LI, Rujian
KANG, Dongwoo
FU, Yongyi
JING, Hao
LIU, Chenliang
LUO, Kang
description The present disclosure relates to an ion implantation amount adjustment device that includes: an adjuster configured to turn on or off an ion outlet of the ion implantation apparatus; and an actuator configured to control movement of the adjuster to adjust an opening degree of the ion outlet.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP3483915A4</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP3483915A4</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP3483915A43</originalsourceid><addsrcrecordid>eNrjZMjy9PdT8PQN8HH0C3EMAXEcff1D_UIUHF28QoNDfF1BzIAAxyDHkNBgBUc_FwVf1xAPfxcdBQyNLq5hns6uOmBFLq4hrkG-nn4QGYgWHgbWtMSc4lReKM3NoODmGuLsoZtakB-fWlyQmJyal1oS7xpgbGJhbGlo6mhiTIQSAEBFNfQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ION IMPLANTATION AMOUNT ADJUSTMENT APPARATUS AND METHOD, ION IMPLANTATION DEVICE, AND DETERMINATION METHOD</title><source>esp@cenet</source><creator>LI, Rujian ; KANG, Dongwoo ; FU, Yongyi ; JING, Hao ; LIU, Chenliang ; LUO, Kang</creator><creatorcontrib>LI, Rujian ; KANG, Dongwoo ; FU, Yongyi ; JING, Hao ; LIU, Chenliang ; LUO, Kang</creatorcontrib><description>The present disclosure relates to an ion implantation amount adjustment device that includes: an adjuster configured to turn on or off an ion outlet of the ion implantation apparatus; and an actuator configured to control movement of the adjuster to adjust an opening degree of the ion outlet.</description><language>eng ; fre ; ger</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20200318&amp;DB=EPODOC&amp;CC=EP&amp;NR=3483915A4$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20200318&amp;DB=EPODOC&amp;CC=EP&amp;NR=3483915A4$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LI, Rujian</creatorcontrib><creatorcontrib>KANG, Dongwoo</creatorcontrib><creatorcontrib>FU, Yongyi</creatorcontrib><creatorcontrib>JING, Hao</creatorcontrib><creatorcontrib>LIU, Chenliang</creatorcontrib><creatorcontrib>LUO, Kang</creatorcontrib><title>ION IMPLANTATION AMOUNT ADJUSTMENT APPARATUS AND METHOD, ION IMPLANTATION DEVICE, AND DETERMINATION METHOD</title><description>The present disclosure relates to an ion implantation amount adjustment device that includes: an adjuster configured to turn on or off an ion outlet of the ion implantation apparatus; and an actuator configured to control movement of the adjuster to adjust an opening degree of the ion outlet.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZMjy9PdT8PQN8HH0C3EMAXEcff1D_UIUHF28QoNDfF1BzIAAxyDHkNBgBUc_FwVf1xAPfxcdBQyNLq5hns6uOmBFLq4hrkG-nn4QGYgWHgbWtMSc4lReKM3NoODmGuLsoZtakB-fWlyQmJyal1oS7xpgbGJhbGlo6mhiTIQSAEBFNfQ</recordid><startdate>20200318</startdate><enddate>20200318</enddate><creator>LI, Rujian</creator><creator>KANG, Dongwoo</creator><creator>FU, Yongyi</creator><creator>JING, Hao</creator><creator>LIU, Chenliang</creator><creator>LUO, Kang</creator><scope>EVB</scope></search><sort><creationdate>20200318</creationdate><title>ION IMPLANTATION AMOUNT ADJUSTMENT APPARATUS AND METHOD, ION IMPLANTATION DEVICE, AND DETERMINATION METHOD</title><author>LI, Rujian ; KANG, Dongwoo ; FU, Yongyi ; JING, Hao ; LIU, Chenliang ; LUO, Kang</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP3483915A43</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2020</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>LI, Rujian</creatorcontrib><creatorcontrib>KANG, Dongwoo</creatorcontrib><creatorcontrib>FU, Yongyi</creatorcontrib><creatorcontrib>JING, Hao</creatorcontrib><creatorcontrib>LIU, Chenliang</creatorcontrib><creatorcontrib>LUO, Kang</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LI, Rujian</au><au>KANG, Dongwoo</au><au>FU, Yongyi</au><au>JING, Hao</au><au>LIU, Chenliang</au><au>LUO, Kang</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ION IMPLANTATION AMOUNT ADJUSTMENT APPARATUS AND METHOD, ION IMPLANTATION DEVICE, AND DETERMINATION METHOD</title><date>2020-03-18</date><risdate>2020</risdate><abstract>The present disclosure relates to an ion implantation amount adjustment device that includes: an adjuster configured to turn on or off an ion outlet of the ion implantation apparatus; and an actuator configured to control movement of the adjuster to adjust an opening degree of the ion outlet.</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
title ION IMPLANTATION AMOUNT ADJUSTMENT APPARATUS AND METHOD, ION IMPLANTATION DEVICE, AND DETERMINATION METHOD
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-17T22%3A29%3A59IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=LI,%20Rujian&rft.date=2020-03-18&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP3483915A4%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true