PROCESSING SYSTEM AND METHOD FOR PROCESSING A FLEXIBLE SUBSTRATE
According to one aspect of the present disclosure, a processing system for processing a flexible substrate is provided. The processing system includes: a vacuum chamber; a transport system configured to guide the flexible substrate through the vacuum chamber along a substrate transportation path (P)...
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| creator | GERTMANN, Reiner LOTZ, Hans-Georg |
| description | According to one aspect of the present disclosure, a processing system for processing a flexible substrate is provided. The processing system includes: a vacuum chamber; a transport system configured to guide the flexible substrate through the vacuum chamber along a substrate transportation path (P), wherein the transport system comprises a first substrate support and a second substrate support arranged at a distance from the first substrate support; and an inspection system for inspecting the flexible substrate. The inspection system includes: a light source configured to direct a light beam through a portion of the flexible substrate between the first substrate support and the second substrate support; and a light detector for detecting the light beam for conducting a transmission measurement of the flexible substrate, wherein at least one of the light source and the light detector is arranged in an environment configured for a second pressure level different from a first pressure level in the vacuum chamber. According to a further aspect, a deposition apparatus is provided. According to a further aspect, a method processing a flexible substrate is provided. |
| format | Patent |
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The processing system includes: a vacuum chamber; a transport system configured to guide the flexible substrate through the vacuum chamber along a substrate transportation path (P), wherein the transport system comprises a first substrate support and a second substrate support arranged at a distance from the first substrate support; and an inspection system for inspecting the flexible substrate. The inspection system includes: a light source configured to direct a light beam through a portion of the flexible substrate between the first substrate support and the second substrate support; and a light detector for detecting the light beam for conducting a transmission measurement of the flexible substrate, wherein at least one of the light source and the light detector is arranged in an environment configured for a second pressure level different from a first pressure level in the vacuum chamber. According to a further aspect, a deposition apparatus is provided. According to a further aspect, a method processing a flexible substrate is provided.</description><language>eng ; fre ; ger</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190508&DB=EPODOC&CC=EP&NR=3478869A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190508&DB=EPODOC&CC=EP&NR=3478869A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>GERTMANN, Reiner</creatorcontrib><creatorcontrib>LOTZ, Hans-Georg</creatorcontrib><title>PROCESSING SYSTEM AND METHOD FOR PROCESSING A FLEXIBLE SUBSTRATE</title><description>According to one aspect of the present disclosure, a processing system for processing a flexible substrate is provided. The processing system includes: a vacuum chamber; a transport system configured to guide the flexible substrate through the vacuum chamber along a substrate transportation path (P), wherein the transport system comprises a first substrate support and a second substrate support arranged at a distance from the first substrate support; and an inspection system for inspecting the flexible substrate. The inspection system includes: a light source configured to direct a light beam through a portion of the flexible substrate between the first substrate support and the second substrate support; and a light detector for detecting the light beam for conducting a transmission measurement of the flexible substrate, wherein at least one of the light source and the light detector is arranged in an environment configured for a second pressure level different from a first pressure level in the vacuum chamber. According to a further aspect, a deposition apparatus is provided. 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The processing system includes: a vacuum chamber; a transport system configured to guide the flexible substrate through the vacuum chamber along a substrate transportation path (P), wherein the transport system comprises a first substrate support and a second substrate support arranged at a distance from the first substrate support; and an inspection system for inspecting the flexible substrate. The inspection system includes: a light source configured to direct a light beam through a portion of the flexible substrate between the first substrate support and the second substrate support; and a light detector for detecting the light beam for conducting a transmission measurement of the flexible substrate, wherein at least one of the light source and the light detector is arranged in an environment configured for a second pressure level different from a first pressure level in the vacuum chamber. According to a further aspect, a deposition apparatus is provided. According to a further aspect, a method processing a flexible substrate is provided.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng ; fre ; ger |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | PROCESSING SYSTEM AND METHOD FOR PROCESSING A FLEXIBLE SUBSTRATE |
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