MARK, OVERLAY TARGET, AND METHODS OF ALIGNMENT AND OVERLAY

A resonant amplitude grating mark has a periodic structure configured to scatter radiation 502 of wavelength » incident 500 on a surface plane 506 of the alignment mark. The scattering is mainly by excitation of a resonant mode 508 in the periodic structure parallel to the surface plane. The effecti...

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Bibliographische Detailangaben

Hauptverfasser:	LALBAHADOERSING, Sanjaysingh, SCIACCA, Beniamino
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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