MARK, OVERLAY TARGET, AND METHODS OF ALIGNMENT AND OVERLAY

A resonant amplitude grating mark has a periodic structure configured to scatter radiation 502 of wavelength » incident 500 on a surface plane 506 of the alignment mark. The scattering is mainly by excitation of a resonant mode 508 in the periodic structure parallel to the surface plane. The effecti...

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Bibliographische Detailangaben
Hauptverfasser:	LALBAHADOERSING, Sanjaysingh, SCIACCA, Beniamino
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A resonant amplitude grating mark has a periodic structure configured to scatter radiation 502 of wavelength » incident 500 on a surface plane 506 of the alignment mark. The scattering is mainly by excitation of a resonant mode 508 in the periodic structure parallel to the surface plane. The effective refractive indexes (n s , n d ) and lengths (L 1 , L 2 ) of portions of the periodic structure are configured to provide an optical path length of the unit cell in the direction of periodicity (n s L 1 + n d L 2 ) that equals an integer multiple of a wavelength present in the spectrum of the radiation (m»). The effective refractive indexes (n s , n d ) and lengths (L 1 , L 2 ) of the portions are also configured to provide an optical path length of the second portion in the direction of periodicity (n d L 2 ) that is equal to half of the wavelength present in the spectrum of the radiation (»/2).