MIXED ABRASIVE POLISHING COMPOSITIONS

The invention provides chemical-mechanical polishing compositions and methods of chemically-mechanically polishing a substrate with the chemical-mechanical polishing compositions. The polishing compositions comprise first abrasive particles, wherein the first abrasive particles are ceria particles,...

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Hauptverfasser: NALASKOWSKI, Jakub, DYSARD, Jeffrey, LAM, Viet, REISS, Brian, JIA, Renhe
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Sprache:eng ; fre ; ger
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creator NALASKOWSKI, Jakub
DYSARD, Jeffrey
LAM, Viet
REISS, Brian
JIA, Renhe
description The invention provides chemical-mechanical polishing compositions and methods of chemically-mechanically polishing a substrate with the chemical-mechanical polishing compositions. The polishing compositions comprise first abrasive particles, wherein the first abrasive particles are ceria particles, second abrasive particles, wherein the second abrasive particles are ceria particles, surface-modified silica particles, or organic particles, a pH-adjusting agent, and an aqueous carrier. The polishing compositions also exhibit multimodal particle size distributions.
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subjects ADHESIVES
CHEMISTRY
DYES
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
POLISHES
POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH
SKI WAXES
title MIXED ABRASIVE POLISHING COMPOSITIONS
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