PROJECTION LENS

A projection lens LN includes a lens substrate 10 and an antireflective film 20 constituted by at least eight layers, formed on a surface of the lens substrate 10. In the antireflective film 20, from an air side, a first layer 21 is formed of MgF 2 , each of a second layer 22, a fourth layer 24, a s...

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Bibliographische Detailangaben
Hauptverfasser:	NAKANO Yoshihiro, TERAMOTO Miyuki, TAKAHARA Koji
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHOTOGRAPHY PHYSICS
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Beschreibung
Zusammenfassung:	A projection lens LN includes a lens substrate 10 and an antireflective film 20 constituted by at least eight layers, formed on a surface of the lens substrate 10. In the antireflective film 20, from an air side, a first layer 21 is formed of MgF 2 , each of a second layer 22, a fourth layer 24, a sixth layer 26, and an eighth layer 28 has a refractive index of 2.0 to 2.3, each of a third layer 23, a fifth layer 25, and a seventh layer 27 is formed of SiO 2 , and quarter wave optical thicknesses Q 1 to Q 8 for the first layer 21 to the eighth layer 28 with respect to a refractive index n s of the lens substrate 10 at a design main wavelength of » 0 = 550 nm satisfy predetermined formulas (1) to (8).