PROCESS, REACTOR AND SYSTEM FOR FABRICATION OF FREESTANDING TWO-DIMENSIONAL NANOSTRUCTURES USING PLASMA TECHNOLOGY

The present invention relates to a process, reactor and system to produce self-standing two-dimensional nanostructures, using a microwave-excited plasma environment. The process is based on injecting, into a reactor, a mixture (9) of gases and precursors in stream regime. The stream is subjected to...

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Hauptverfasser: SOARES GONÇALVES, Bruno Miguel, DA MOTA CAPITÃO LEMOS ALVES, Luís Paulo, DOS SANTOS DUARTE VIEIRA HENRIQUES, Júlio Paulo, STEFANOVA TATAROVA, Elena
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creator SOARES GONÇALVES, Bruno Miguel
DA MOTA CAPITÃO LEMOS ALVES, Luís Paulo
DOS SANTOS DUARTE VIEIRA HENRIQUES, Júlio Paulo
STEFANOVA TATAROVA, Elena
description The present invention relates to a process, reactor and system to produce self-standing two-dimensional nanostructures, using a microwave-excited plasma environment. The process is based on injecting, into a reactor, a mixture (9) of gases and precursors in stream regime. The stream is subjected to a surface wave (5) electric field, excited by the use of microwave power (7) which is introduced into a field applicator (6), generating high energy density plasmas (2,3,4), that break the precursors into its atomic and/or molecular constituents. The system comprises a plasma reactor with a surface wave launching zone, a transient zone with a progressively increasing cross-sectional area, and a nucleation zone. The plasma reactor together with an infrared radiation source (11) provides a controlled adjustment of the spatial gradients, of the temperature and the gas stream velocity. The majority of the obtained two-dimensional nanostructures samples have a thickness of a single atomic layer, in addition the process and system allow to obtain graphene production rates of the order of one gram per hour and higher.
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subjects CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
COMPOUNDS THEREOF
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
INORGANIC CHEMISTRY
MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES
METALLURGY
NANOTECHNOLOGY
NON-METALLIC ELEMENTS
PERFORMING OPERATIONS
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
TRANSPORTING
title PROCESS, REACTOR AND SYSTEM FOR FABRICATION OF FREESTANDING TWO-DIMENSIONAL NANOSTRUCTURES USING PLASMA TECHNOLOGY
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