SUBMICRON PARTICLE REMOVAL FROM GAS STREAMS

SUBMICRON PARTICLE REMOVAL FROM GAS STREAMS

Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing l...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HIGGINS, Brian Sayre, YATES, Robert Arthur, DIRKX, Wilfried Marc Renaat, TATE III, John Marshall, HEON, Jon Michael, POMERLEAU, Marcel Julien, COLOMA GONZÁLEZ, Juan
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
ACYCLIC OR CARBOCYCLIC COMPOUNDS
CHEMISTRY
FERTILISERS
MANUFACTURE THEREOF
METALLURGY
NITROGENOUS FERTILISERS
ORGANIC CHEMISTRY
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
SEPARATION
TRANSPORTING
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Beschreibung
Zusammenfassung:Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3/h)/(m3/h).