HYDROCHLORIC ACID PURIFICATION PROCESS AND PLANT
Disclosed is a process for treating a gas stream containing hydrochloric acid, hydrofluoric acid, a fluorinated compound and halogenated organic compounds, wherein the gas stream is subjected to: (a) a step of washing with an acid solution to obtain a washed gas stream; (b) a step of adiabatic absor...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | Disclosed is a process for treating a gas stream containing hydrochloric acid, hydrofluoric acid, a fluorinated compound and halogenated organic compounds, wherein the gas stream is subjected to: (a) a step of washing with an acid solution to obtain a washed gas stream; (b) a step of adiabatic absorption in an aqueous solution of the hydrochloric acid contained in said washed gas stream, to collect a solution of hydrochloric acid; (c) a step of adsorption on activated carbon of the impurities present in said hydrochloric acid solution, to obtain a purified hydrochloric acid solution and a gas stream containing said fluorinated compound; and (d) a step of bringing said purified hydrochloric acid solution into contact with a silica gel. Also disclosed is a plant for the implementation of this process, and also a process for preparing a fluorinated compound comprising the catalytic pyrolysis of an organofluorine compound. |
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