DEVICE AND METHOD FOR MATERIAL PROCESSING

Apparatuses and methods for material processing are disclosed. In an embodiment, an apparatus may include a source of electromagnetic radiation that emits the radiation in a beam with a defined power density distribution and beam-shaping optics variably shaping and focusing the radiation of the beam source. An optical axis of the radiation may be directed onto a processing zone. The apparatus may also include means for holding the radiation in a region wherein the radiation interacts with a material forming and moving in the processing zone; as well as an adjusting device that varies the second beam parameter product by changing at least one of a position and an optical property of at least one optical element. In an embodiment, a first optical element of the beam-shaping optics generates or increases the amount of an aberration; and a second optical element of the beam-shaping optics changes an amount of an aberration generated or increased by changing, using the adjusting device, a position or optical properties the first and/or the second optical element, such that the second beam parameter product is adjusted.