METHODS AND APPARATUS FOR DETERMINING THE POSITION OF A SPOT OF RADIATION AND INSPECTION APPARATUS

A beam (542, 556) of soft x-ray (SXR) radiation is generated by focusing infrared (IR) radiation (540) at a source location so as to generate the SXR radiation (542) by higher harmonic generation in a gas cell (532). An illumination optical system (512) focuses the SXR radiation into a spot (S) of r...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	LIN, Nan, VAN VOORST, Peter, Danny, TUKKER, Teunis, Willem
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING X-RAY TECHNIQUE
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A beam (542, 556) of soft x-ray (SXR) radiation is generated by focusing infrared (IR) radiation (540) at a source location so as to generate the SXR radiation (542) by higher harmonic generation in a gas cell (532). An illumination optical system (512) focuses the SXR radiation into a spot (S) of radiation by imaging the source location onto a metrology target (T). To determine the location of the spot of SXR radiation, the same illumination optical system is used to form a spot of the IR radiation onto an alignment target material. A spot of visible radiation is generated by second harmonic generation in an interaction between the IR radiation and the alignment target material. The visible spot is observed by an alignment camera (564). A special alignment target (592) may be provided, or material present in or near the metrology target can be used.