EXHAUST GAS PURIFICATION DEVICE

An exhaust gas purification device according to the present invention is provided with: a substrate 10 of wall-flow structure having an inlet cell 12, an outlet cell 14 and a porous partition wall 16; an upstream catalyst layer 20 provided inside the partition wall 16 and disposed in an upstream por...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: NOMURA, Yasutaka, INODA, Satoru, MIYOSHI, Naoto, TAKEUCHI, Masahiko, SATO, Akemi, KURIYAMA, Junji
Format: Patent
Sprache:eng ; fre ; ger
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Beschreibung
Zusammenfassung:An exhaust gas purification device according to the present invention is provided with: a substrate 10 of wall-flow structure having an inlet cell 12, an outlet cell 14 and a porous partition wall 16; an upstream catalyst layer 20 provided inside the partition wall 16 and disposed in an upstream portion, including an exhaust gas inflow end section, of the substrate 10; and a downstream catalyst layer 30 provided inside the partition wall 16 and disposed in a downstream portion, including an exhaust gas outflow end section, of the substrate 10. The downstream catalyst layer 30 contains a carrier, and Rh supported on the carrier. The upstream catalyst layer 20 contains a carrier, and Pd and/or Pt supported on the carrier.