NOVEL COMPOUND AND SEMICONDUCTOR MATERIAL CONTAINING SAME

There is provided a semiconductor material with which a semiconductor device exhibiting high mobility can be fabricated by a wet film forming method, and there is provided a compound which can provide the semiconductor material. The compound is represented by General Formula (1) (wherein Ar represen...

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Bibliographische Detailangaben
Hauptverfasser:	INAGAKI, Sho, ISHIZUKA, Aya, ETORI, Hideki
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS ADHESIVES APPARATUS THEREFOR BASIC ELECTRIC ELEMENTS CHEMICAL PAINT OR INK REMOVERS CHEMISTRY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS CORRECTING FLUIDS DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FILLING PASTES GENERAL METHODS OF ORGANIC CHEMISTRY INKS METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC CHEMISTRY PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING POLISHES SEMICONDUCTOR DEVICES USE OF MATERIALS THEREFOR WOODSTAINS
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Beschreibung
Zusammenfassung:	There is provided a semiconductor material with which a semiconductor device exhibiting high mobility can be fabricated by a wet film forming method, and there is provided a compound which can provide the semiconductor material. The compound is represented by General Formula (1) (wherein Ar represents an aryl group which may have a substituent or a heteroaryl group which may have a substituent, and R 1 represents an acyclic alkyl group having 1 to 20 carbon atoms wherein hydrogen atom in the alkyl group may be replaced by a halogeno group, a nitrile group or an aryl group, and -CH 2 -in the alkyl group may be replaced by -O-, -R'C=CR'-, -CO-, -OCO-, -COO-, -S-, -SO 2 -, -SO-, -NH-, -NR'- or -C¡C- provided that, with respect to each of an oxygen atom, a sulfur atom and a nitrogen atom, the same atoms are not directly bonded to each other, wherein R' represents an acyclic or cyclic alkyl group having 1 to 20 carbon atoms).