ACCURACY IMPROVEMENTS IN OPTICAL METROLOGY

Methods, metrology modules and target designs are provided, which improve the accuracy of metrology measurements. Methods provide flexible handling of multiple measurement recipes and setups and enable relating them to landscape features that indicate their relation to resonance regions and to flat...

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Bibliographische Detailangaben
Hauptverfasser:	BRINGOLTZ, Barak, FELER, Yoel, SALTOUN, Lilach, GUREVICH, Evgeni, LEVIANT, Tom, ADAM, Ido, SELLA, Noga, ASHWAL, Eltsafon, ALUMOT, Dror, YAZIV, Tal, DELEEUW, Yaron, LAMHOT, Yuval
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	Methods, metrology modules and target designs are provided, which improve the accuracy of metrology measurements. Methods provide flexible handling of multiple measurement recipes and setups and enable relating them to landscape features that indicate their relation to resonance regions and to flat regions. Clustering of recipes, self-consistency tests, common processing of aggregated measurements, noise reduction, cluster analysis, detailed analysis of the landscape and targets with skewed cells are employed separately or in combination to provide cumulative improvements of measurement accuracy.