PROCESS FOR CLEANING A SUBSTRATE CONTAMINATED BY PARTICLES

The present invention relates to a process for cleaning a substrate contaminated by particles, comprising the following steps: - depositing on the surface of the substrate a polymer matrix comprising water and a polymer, the polymer consisting of units derived from one or more acrylic monomers of fo...

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Bibliographische Detailangaben
Hauptverfasser: CLAVAGUERA, Simon, REYNES, Mathias, MOTELLIER, Sylvie
Format: Patent
Sprache:eng ; fre ; ger
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Beschreibung
Zusammenfassung:The present invention relates to a process for cleaning a substrate contaminated by particles, comprising the following steps: - depositing on the surface of the substrate a polymer matrix comprising water and a polymer, the polymer consisting of units derived from one or more acrylic monomers of formula CH2 =CR1-C(=O)-R2, and optionally at least one crosslinking agent, with R1= H or CH3, R2= NH2 ; NHR3; NR32; or OR3, R3= H or a hydrocarbon-based group comprising 1 to 22 carbon atoms; - impregnating particles into the polymer matrix; - forming a varnish by drying the polymer matrix; -removing the varnish and the particles trapped in the varnish.