SEALING PROCESS FOR AN ANODIZED ALUMINUM-ALLOY SURFACE

A sealing process (30) includes applying a first reactant to a substrate (12) having a porous structure (16) , the first reactant (18) comprising a chromium (III) precursor and a transition metal precursor and applying a second reactant (22) to the first reactant, the second reactant comprising a ra...

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Bibliographische Detailangaben
Hauptverfasser:	KRYZMAN, Michael A, BHAATIA, Promila, DING, Zhongfen, JAWOROWSKI, Mark R, LI, Weina, ZAFIRIS, Georgios S, VAN HASSEL, Bart Antonie, ZHANG, Weilong, SMITH, Blair A
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS THEREFOR CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A sealing process (30) includes applying a first reactant to a substrate (12) having a porous structure (16) , the first reactant (18) comprising a chromium (III) precursor and a transition metal precursor and applying a second reactant (22) to the first reactant, the second reactant comprising a rare earth element precursor and an alkaline earth element precursor to form reservoirs of trivalent chromium in pore space of the porous structure, and a physical barrier (30) over the substrate and the reservoirs.