MONOCRYSTALLINE SEMICONDUCTOR WAFER AND METHOD FOR PRODUCING A SEMICONDUCTOR WAFER

A monocrystalline semiconductor wafers have an average roughness Ra of at most 0.8 nm at a limiting wavelength of 250 μm, and an ESFQRavg of 8 nm or less given an edge exclusion of 1 mm. The wafers are advantageously produced by a method comprising the following steps in the indicated order:a) simul...

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Hauptverfasser: RÖTTGER, Klaus, MÜHE, Andreas, BECKER, Herbert, MISTUR, Leszek
Format: Patent
Sprache:eng ; fre ; ger
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