SUBSTRATE TABLE, LITHOGRAPHIC APPARATUS AND METHOD OF OPERATING A LITHOGRAPHIC APPARATUS

A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan...

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Bibliographische Detailangaben
Hauptverfasser:	ZDRAVKOV, Aleksandar Nikolov, BALTIS, Coen Hubertus Matheus, POLET, Theodorus Wilhelmus, VAN SOMMEREN, Daan Daniel Johannes Antonius, GATTOBIGIO, Giovanni Luca, VIEYRA SALAS, Jorge Alberto, MELMAN, Johannes Cornelis Paulus, VAN LIESHOUT, Josephus Peter, STALS, Walter Theodorus Matheus, VAN DE VIJVER, Yuri Johannes Gabriël, BUDDENBERG, Harold Sebastiaan, NAKIBOGLU, Günes
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface and at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.