METHOD AND APPARATUS FOR MEASURING A CURVED WAVEFRONT USING AT LEAST ONE WAVEFRONT SENSOR

METHOD AND APPARATUS FOR MEASURING A CURVED WAVEFRONT USING AT LEAST ONE WAVEFRONT SENSOR

With regard to a particularly precise measurement of a wavefront using structurally simple means, a method for measuring a curved wavefront using a wavefront sensor is specified, wherein a plurality of measurements are carried out at different positions along the wavefront using at least one wavefro...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SCHITTER, Georg, PARIS, Rene, THIER, Markus, YOO, Han Woong, UNGER, Severin
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
COLORIMETRY
MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT
MEASURING
PHYSICS
RADIATION PYROMETRY
TESTING
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Beschreibung
Zusammenfassung:With regard to a particularly precise measurement of a wavefront using structurally simple means, a method for measuring a curved wavefront using a wavefront sensor is specified, wherein a plurality of measurements are carried out at different positions along the wavefront using at least one wavefront sensor in order to determine a local gradient of the wavefront at the different positions, which method is characterized in that the plurality of measurements are carried out in each case with a substantially tangential alignment of a light entrance plane of the wavefront sensor(s) with the curved wavefront. A corresponding apparatus for measuring a curved wavefront using a wavefront sensor is also specified.