LITHOGRAPHIC APPARATUS BEING OPERABLE TO DETERMINE PELLICLE DEGRADATION COMPENSATION CORRECTIONS

Disclosed is a method for mitigating an effect of non-uniform pellicle degradation on control of a substrate patterning process and an associated lithographic apparatus. The method comprises quantifying an effect of the non-uniform pellicle degradation on one or more properties of patterned features...

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Bibliographische Detailangaben
Hauptverfasser:	LI, Chung-Hsun, VAN DE RUIT, Kevin, DE JONG, Frederik Eduard, BROUWER, Cornelis, Melchior, VAN KESSEL, Marcel, Theodorus, Maria
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Disclosed is a method for mitigating an effect of non-uniform pellicle degradation on control of a substrate patterning process and an associated lithographic apparatus. The method comprises quantifying an effect of the non-uniform pellicle degradation on one or more properties of patterned features, such as metrology targets, formed on the substrate by the substrate patterning process. A process control correction is then determined based on the quantification of the effect of the non-uniform pellicle degradation.