ANTI-REFLECTIVE FILM

The present invention relates to an antireflection film which exhibits one extremum at a thickness of 35 nm to 55 nm from the surface and exhibiting one extremum at a thickness of 85 nm to 105 nm from the surface in a graph showing the result of Fourier transform analysis for the result of X-ray ref...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	KIM, Boo Kyung, BYUN, Jin Seok, KOO, Ja Pil, JANG, Seok Hoon, CHANG, Yeong Rae
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMISTRY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS GENERAL PROCESSES OF COMPOUNDING INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM MEASURING METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS PERFORMING OPERATIONS PHYSICS TESTING THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING TREATMENT OR CHEMICAL MODIFICATION OF RUBBERS WORKING-UP
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Beschreibung
Zusammenfassung:	The present invention relates to an antireflection film which exhibits one extremum at a thickness of 35 nm to 55 nm from the surface and exhibiting one extremum at a thickness of 85 nm to 105 nm from the surface in a graph showing the result of Fourier transform analysis for the result of X-ray reflectivity measurement using Cu-K-alpha rays.