PHOTOCURABLE COMPOSITION, DENTURE BASE, AND PLATE DENTURE

The present invention provides: a photocurable composition including a monomer component that includes: a monomer (X) containing, within one molecule, two aromatic rings and two (meth)acryloyloxy groups, and having an Mw of from 400 to 580, and a monomer (H) containing, within one molecule, at least...

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Bibliographische Detailangaben
Hauptverfasser: KOURA, Takashi, KOJIMA, Kouya, SHIODE, Hirohisa, SAKAMAKI, Toshikazu, KIMURA, Mai
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:The present invention provides: a photocurable composition including a monomer component that includes: a monomer (X) containing, within one molecule, two aromatic rings and two (meth)acryloyloxy groups, and having an Mw of from 400 to 580, and a monomer (H) containing, within one molecule, at least one of a hydroxyl group or a carboxy group, and a (meth)acryloyloxy group, and having an Mw of from 100 to 700; as well as a photopolymerization initiator. The above described photocurable composition has a functional group value (a), as defined below, of from 0.5 × 10 -3 to 2.0 × 10 -3 mol/g. functional group value a = n H / M H × P H In the above Formula, n H represents the total number of hydroxyl groups and carboxy groups contained in one molecule of the (meth)acrylic monomer (H); M H represents the MW of the (meth)acrylic monomer (H); and P H represents the mass ratio of the (meth)acrylic monomer (H) with respect to the total amount of the (meth)acrylic monomer component.